|
|
|
1. |
Chemical vapor deposition for microelectronics : principles, technology and applications /
by Sherman, Arthur
Publication:
New Jersey : Noyes Publications, 1987
. XI, 215 p. :
25 cm.
Date:1987
Availability:
No items available:
Checked out (1),
Actions:
|
|
|
2. |
Chemical Vapor Deposition of refractory metals and ceramics II
Publication:
Pittsburgh : Materials Research Society, 1992
. XI, 376 p. :
24 cm.
Date:1992
Availability:
No items available:
Actions:
|
|
|
3. |
Handbook of sputter deposition technology : principles, technology and applications /
by Wasa, Kiyotaka
Publication:
Park Ridge : Noyes Publications, 1992
. XII, 304 p. :
24 cm.
Date:1992
Availability:
No items available:
Checked out (1),
Actions:
|
|
|
4. |
Photochemical vapor deposition /
by Eden, J. G.
Publication:
New York : Wiley, 1992
. XI, 193 p. :
24 cm.
Date:1992
Availability:
No items available:
Checked out (1),
Actions:
|
|
|
5. |
Chemical vapor deposition /
Publication:
Materials Park, OH : ASM International, 2001
. vii, 481 p. :
26 cm
Date:2001
Availability:
No items available:
Checked out (2),
Actions:
|
|
|
6. |
Physical vapor deposition of thin films /
by Mahan, John E.
Publication:
New York : John Wiley & Sons, 2000
. XIII, 312 p. :
24 cm.
Date:2000
Availability:
No items available:
Checked out (1),
Actions:
|
|
|
7. |
Thin - film deposition : principles and practice /
by Smith, Donald L.
Publication:
Boston : McGraw Hill, 1995
. XXIII, 616 p. :
23 cm.
Date:1995
Availability:
No items available:
Checked out (1),
Actions:
|
|
|
8. |
Gold plating technology /
Publication:
Isola di Man : Electrochemical Publication Limited, 1974
. XIX, p. 630 ;
22 cm.
Date:1974
Availability:
No items available:
Checked out (1),
Actions:
|
|
